Thin film deposition

Tantalum and cobalt metal deposited with Ångstrom-level control

Ronan LeonardJuly 27, 2016

Tantalum metal has been deposited with Å-level control for the first time at low temperature without plasma by researchers at Wayne State University in the USA....

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Holst Centre and TNO showcase Spatial Atomic Layer Deposition for Flexible Electronics

Ronan LeonardJuly 26, 2016

A breakthrough materials processing technique devised by a Dutch research team could lead the way for a new generation of smart fabrics, wearable electronics, s...

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16th International Conference on Atomic Layer Deposition (ALD 2016) in Dublin

Ronan LeonardJuly 26, 2016

The 16th International Conference on Atomic Layer Deposition (ALD 2016) is a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. In every year since 2001, the conference has been held alte...

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