ALD

Tantalum and cobalt metal deposited with Ångstrom-level control

Ronan LeonardJuly 27, 2016

Tantalum metal has been deposited with Å-level control for the first time at low temperature without plasma by researchers at Wayne State University in the USA....

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Holst Centre and TNO showcase Spatial Atomic Layer Deposition for Flexible Electronics

Ronan LeonardJuly 26, 2016

A breakthrough materials processing technique devised by a Dutch research team could lead the way for a new generation of smart fabrics, wearable electronics, s...

EUEventsFuture TrendsGlobal NewsHome AutomationInnovationIrelandSolar PowerWearable Technology

16th International Conference on Atomic Layer Deposition (ALD 2016) in Dublin

Ronan LeonardJuly 26, 2016

The 16th International Conference on Atomic Layer Deposition (ALD 2016) is a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. In every year since 2001, the conference has been held alte...

DublinEUEventsFuture TrendsGlobal NewsInnovationIreland

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